O*NET-SOC-Code
17-2199.09

Design, develop, or supervise the production of materials, devices, or systems of unique molecular or macromolecular composition, applying principles of nanoscale physics and electrical, chemical, or biological engineering.

Berufsbezeichnungen und Aufgabenbeschreibungen werden wie veröffentlicht auf Englisch angezeigt. Beschriftungen, einschließlich der Aufgabenarten, sind übersetzt.

KI-Exposition

  • Datenquelle: BLSVeröffentlicht: 2026-08

    Sehr hoch· relativ

    NiedrigVier relative BänderSehr hoch

    Wert auf Berufsgruppenebene

    Skala, Bezugsmenge und Quelle

    Vier relative Bänder (Niedrig / Mittel / Hoch / Sehr hoch)

    831 detaillierte Berufe in der BLS-Beschäftigungsprojektionstabelle. Der Wert wird je Code der National Employment Matrix (NEM) vergeben, daher erhalten Berufe mit demselben NEM-Code dasselbe Band

    Quelldatensatz (XLSX-Download)

  • Datenquelle: AnthropicVeröffentlicht: 2026-03

    0.066

    0.000Spannweite der hier geführten Werte0.745

    Wert auf Berufsgruppenebene

    Skala, Bezugsmenge und Quelle

    Index der beobachteten Exposition, 0–1 wie veröffentlicht

    Auf O*NET-Aufgaben abgebildet

    Veröffentlicht je SOC-2018-Beruf; jeder O*NET-Beruf mit demselben SOC-2018-Code erhält diesen Wert

    Quelldatensatz (CSV-Download)

  • Datenquelle: ILOVeröffentlicht: 2025

    0.30

    0.09Spannweite der hier geführten Werte0.70

    Wert auf Berufsgruppenebene

    Skala, Bezugsmenge und Quelle

    Index der Exposition gegenüber generativer KI, 0–1 wie veröffentlicht

    Veröffentlicht je ISCO-08-Berufsgattung. Mit diesem Beruf ganz oder teilweise verknüpft durch Anwendung der Umsteigeschlüssel des U.S. Bureau of Labor Statistics (ISCO-08 zu SOC 2010, SOC 2010 zu SOC 2018) in veröffentlichter Form

    Quelldatensatz (PDF-Download)

Welche Art von Wert diese Quelle veröffentlicht

Die Kategorie von BLS ist ein relativer Rang und kein absolutes Niveau, und sie ist keine eigene Messung: Sie fasst die Perzentilränge des Berufs aus mehreren veröffentlichten Studien in vier Bänder zusammen. Sie ist weder eine Beschäftigungs- oder Lohnprognose noch eine Einführungswahrscheinlichkeit und unterscheidet nicht zwischen Automatisierung und Augmentierung.

KI-Exposition (OpenAI-Rubrik)

25 bewertete Aufgaben · 23 Aufgaben mit β ≥ 0,5 (92.0%)

β = direkte Exposition (E1) + 0,5 × Exposition bei verfügbaren Werkzeugen (E2), gemäß der Definition des Quell-Repositorys.

  • Quelleinheit: Aufgaben aus O*NET 27.2 → Berufscode aus O*NET 31.0
  • Alle bewerteten Aufgaben stehen in der Aufgabenliste von O*NET 31.0.
Quelle
OpenAI "GPTs are GPTs" exposure rubric
Ausgabe
gh-main-0471612
Lizenz
MIT License, Copyright (c) 2024 OpenAI

Aufgaben

Aufgabenbeschreibungen aus der O*NET® 31.0 Database, Kernaufgaben zuerst.

AufgabeArtβ (OpenAI)
Write proposals to secure external funding or to partner with other companies.Kern1
Supervise technologists or technicians engaged in nanotechnology research or production.Kern0,5
Synthesize, process, or characterize nanomaterials, using advanced tools or techniques.Kern0
Identify new applications for existing nanotechnologies.Kern0,5
Provide technical guidance or support to customers on topics such as nanosystem start-up, maintenance, or use.Kern0,5
Generate high-resolution images or measure force-distance curves, using techniques such as atomic force microscopy.Kern0,5
Prepare reports, deliver presentations, or participate in program review activities to communicate engineering results or recommendations.Kern1
Develop processes or identify equipment needed for pilot or commercial nanoscale scale production.Kern0,5
Provide scientific or technical guidance or expertise to scientists, engineers, technologists, technicians, or others, using knowledge of chemical, analytical, or biological processes as applied to micro and nanoscale systems.Kern0,5
Engineer production processes for specific nanotechnology applications, such as electroplating, nanofabrication, or epoxy.Kern0
Design or conduct tests of new nanotechnology products, processes, or systems.Kern0,5
Coordinate or supervise the work of suppliers or vendors in the designing, building, or testing of nanosystem devices, such as lenses or probes.Kern0,5
Design or engineer nanomaterials, nanodevices, nano-enabled products, or nanosystems, using three-dimensional computer-aided design (CAD) software.Kern0,5
Create designs or prototypes for nanosystem applications, such as biomedical delivery systems or atomic force microscopes.Kern0,5
Conduct research related to a range of nanotechnology topics, such as packaging, heat transfer, fluorescence detection, nanoparticle dispersion, hybrid systems, liquid systems, nanocomposites, nanofabrication, optoelectronics, or nanolithography.Kern1
Apply nanotechnology to improve the performance or reduce the environmental impact of energy products, such as fuel cells or solar cells.Kern0,5
Design nano-enabled products with reduced toxicity, increased durability, or improved energy efficiency.Kern0,5
Prepare nanotechnology-related invention disclosures or patent applications.Ergänzend1
Design nano-based manufacturing processes to minimize water, chemical, or energy use, as well as to reduce waste production.Ergänzend0,5
Design nanoparticle catalysts to detect or remove chemical or other pollutants from water, soil, or air.Ergänzend0,5
Design nanosystems with components such as nanocatalysts or nanofiltration devices to clean specific pollutants from hazardous waste sites.Ergänzend0,5
Develop catalysis or other green chemistry methods to synthesize nanomaterials, such as nanotubes, nanocrystals, nanorods, or nanowires.Ergänzend1
Develop green building nanocoatings, such as self-cleaning, anti-stain, depolluting, anti-fogging, anti-icing, antimicrobial, moisture-resistant, or ultraviolet protectant coatings.Ergänzend1
Integrate nanotechnology with antimicrobial properties into products, such as household or medical appliances, to reduce the development of bacteria or other microbes.Ergänzend0,5
Reengineer nanomaterials to improve biodegradability.Ergänzend1

Berufsinformationen

Quellen und Namensnennung

This page includes information from the O*NET® 31.0 Database (https://www.onetcenter.org/database.html) by the U.S. Department of Labor, Employment and Training Administration (USDOL/ETA). Used under the CC BY 4.0 license (https://creativecommons.org/licenses/by/4.0/). O*NET® is a trademark of USDOL/ETA. AI Changing Work has modified all or some of this information: the O*NET-SOC code, title and task statements are reproduced in English without change; task-type labels are shown in the page's language and tasks are listed core first; any Korean occupation title shown on the Korean-language page is AI Changing Work's translation; any KSCO-8 unit groups linked to this occupation were paired with it by AI Changing Work's judgment, and the relation labels and statuses are AI Changing Work's additions. USDOL/ETA has not approved, endorsed, or tested these modifications.

Any AI exposure figures on this page are published by third parties, not by AI Changing Work, and none is part of the O*NET information. OpenAI publishes task-level scores (MIT License) for O*NET 27.2 task statements; each is shown next to the O*NET 31.0 task statement with the same task ID, whose wording can differ from the 27.2 statement that was scored. OpenAI also publishes occupation-level scores for O*NET-SOC codes in the same release, and any such score is shown on the O*NET occupation with the same code. Anthropic publishes an observed exposure index in the Anthropic Economic Index (CC-BY), and the U.S. Bureau of Labor Statistics publishes relative AI exposure categories (public domain); both are published per SOC code, and each value is shown on every O*NET occupation with that code. The International Labour Organization publishes a generative AI exposure index in ILO Working Paper 140 (CC BY 4.0) for ISCO-08 unit groups; AI Changing Work links those groups to O*NET occupations by applying the U.S. Bureau of Labor Statistics ISCO-08 to 2010 SOC and 2010 SOC to 2018 SOC crosswalks as published, without case-by-case selection, and these crosswalks match many groups only in part. Where several unit groups are linked, each group's published value is listed, and any summary shows only the lowest and highest of those values with the number of groups; no exposure figure is averaged or recalculated. Any employment figures are published by the U.S. Bureau of Labor Statistics for the SOC group containing this occupation. Each source is credited where its figures are shown.

O*NET OnLine: 17-2199.09 Nanosystems Engineers

KSCO 코드·명칭: 한국표준직업분류(제8차 개정) — 통계청 고시 제2024-328호 (2024-07-01 고시, 2025-01-01 시행). 저작권법 제7조 제2호의 고시 항목이다. 명칭 표기(가운뎃점·띄어쓰기)는 해설서 2차 정오 반영판의 표기를 따랐으며, 고시 항목표와는 18개 명칭에서 가운뎃점 글리프나 띄어쓰기만 다르다. 통계청은 2025년 10월 국가데이터처로 개편되었다. 이 페이지의 KSCO 연결은 통계청·국가데이터처의 공식 연계표가 아니다.

Vollständige Namensnennung und Lizenzen